THE EFFECT OF ANNEALING ON NiO THIN FILM PRODUCED BY THERMAL EVAPORATION
3RD INTERNATIONAL CONFERENCE ON PHYSICAL CHEMISTRY & FUNCTIONAL MATERIALS, Malatya, Türkiye, 22 - 24 Eylül 2020, ss.30, (Özet Bildiri)
- Yayın Türü: Bildiri / Özet Bildiri
- Basıldığı Şehir: Malatya
- Basıldığı Ülke: Türkiye
- Sayfa Sayıları: ss.30
- Van Yüzüncü Yıl Üniversitesi Adresli: Evet
Özet
In this study, p type NiO thin
films were produced using the thermal evaporation method that least affects the
physical properties of the target sample. The nano powdered nickel (II) oxide
was thermally evaporated onto the microscope glass cleaned by conventional
method. Optical transmittance values of the NiO thin films were determined by a
UV-Visible (UV-Vis) spectrophotometer. The optical band gaps of non-annealed
and annealed NiO thin films were determined as 3.54 and 3.48 eV, respectively.
XRD, SEM, AFM, EDX and XPS measurements were also performed to examine the
effect of annealing in NiO thin films.