THE EFFECT OF ANNEALING ON NiO THIN FILM PRODUCED BY THERMAL EVAPORATION

Özkartal A.

3RD INTERNATIONAL CONFERENCE ON PHYSICAL CHEMISTRY & FUNCTIONAL MATERIALS, Malatya, Türkiye, 22 - 24 Eylül 2020, ss.30, (Özet Bildiri)

  • Yayın Türü: Bildiri / Özet Bildiri
  • Basıldığı Şehir: Malatya
  • Basıldığı Ülke: Türkiye
  • Sayfa Sayıları: ss.30
  • Van Yüzüncü Yıl Üniversitesi Adresli: Evet

Özet

In this study, p type NiO thin films were produced using the thermal evaporation method that least affects the physical properties of the target sample. The nano powdered nickel (II) oxide was thermally evaporated onto the microscope glass cleaned by conventional method. Optical transmittance values of the NiO thin films were determined by a UV-Visible (UV-Vis) spectrophotometer. The optical band gaps of non-annealed and annealed NiO thin films were determined as 3.54 and 3.48 eV, respectively. XRD, SEM, AFM, EDX and XPS measurements were also performed to examine the effect of annealing in NiO thin films.